FabSCIL now available to order
Our industry leading nanoimprint system for 200 and 300mm wafers is ready to order.
The unique imprint quality and overlay alignment spec of < 1µm makes it ideal for high volume production of AR waveguides, diffractive optical elements, metalenses, lasers and many other nanophotonic products.
Combined with SCIL’s imprint materials portfolio (up to 1.95 refractive index) the FabSCIL is your best choice for high volume production of nanophotonics.
SCIL application and pilot production center.
In Q1-2023 SCIL will expand its facilities with a FabSCIL system. This will enable us to develop imprint processes for the applications of our customers and to perform sample and pilot production runs on 100, 150, 200 and 300mm wafers.
Want to know more? Contact us at firstname.lastname@example.org .