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nano-scale precision

Offering solutions for high-resolution patterning at the nanoscale level by using our unique and proprietary lithography technology:

Substrate Conformal Imprint Lithography (SCIL)


Small & High volume production


Stamp and imprint materials

Support & Processing

Dedicated processes

Schematic of stamp, substrate and resist in conformal lithography printing of substrate

Why Substrate Conformal Imprint Lithography?

SCIL stands for ‘Substrate Conformal Imprint Lithography’, a cost effective, robust, high yield process enabling nanometer resolution on a large variety of substrates. 

Optical performance

Our scalable process reduces your risks from concept to volume manufacture using compatible processes and materials.

Essentially, optimal equipment design ensures best output with optimal cost performance.

You can jump-start your production into the market and be assured that your solutions will be of the highest quality.

Example wafers of nanopatterns using SCIL

Let’s work together on your next project

Do you have any questions? We are happy to help you!