Offering solutions for high-resolution patterning at the nanoscale level by using our unique and proprietary lithography technology:
Small & High volume production
Stamp and imprint materials
Support & Processing
Why Substrate Conformal Imprint Lithography?
SCIL stands for ‘Substrate Conformal Imprint Lithography’, a cost effective, robust, high yield process enabling nanometer resolution on a large variety of substrates.
Our scalable process reduces your risks from concept to volume manufacture using compatible processes and materials.
Essentially, optimal equipment design ensures best output with optimal cost performance.
You can jump-start your production into the market and be assured that your solutions will be of the highest quality.