Research and development is important for us. We are continuously working to provide solutions to the challenges present in the market. In addition, we participate in conferences and collaborate with other companies and universities that use SCIL technology for their research.

Publications

Some of the SCIL related most interesting publications are:

• Novel optical metrology for inspection of nanostructures fabricated by substrate conformal imprint lithography – IOPscience (2022) Nevels T.D.G., Ruijs L.J.M., van de Meugheuvel P., Verschuuren M., Gómez Rivas J. and Ramezani M. Journal of Optics, Vol. 24, 9

• Substrate conformal imprint fabrication process of synthetic antiferromagnetic nanoplatelets | Applied Physics Letters | AIP Publishing (2022). Li J., van Nieuwkerk P., Verschuuren M., Koopmans B., R. Lavrijsen. Applied Physics Letters, Vol. 121, Issue 18

• X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating (optica.org) (2020). McCoy J.A.,  Verschuuren M., Miles D. M., and Mc Entaffer R.L. OSA Continuum. Vol. 3,Issue 11, 3141-3156

• Nanoscale spatial limitations of large-area substrate conformal imprint lithography – IOPscience (2019). Verschuuren M., Knight M.W., Megens M. and Polman A. Nanotechnology, Vol. 30, 34.

• Frontiers | Nano- and Micro-Patterned S-, H-, and X-PDMS for Cell-Based Applications: Comparison of Wettability, Roughness, and Cell-Derived Parameters (frontiersin.org) (2018). Scharin-Mehlmann M., Häring A., Rommel M., Dirnecker T., Friedrich O., Frey L. and Gilbert D.F. Front. Bioengineering and Biotechnology., Sec. Biomaterials, Vol.6

• Large-area-nanoimprint-by-substrate-conformal-imprint-lithography-Adv-Opt-Tech.pdf (lmpv.nl) (2017). Advanced Optical Technologies. 2017; 6(3-4): 243–264

• Plasmonics for solid-state lighting: enhanced excitation and directional emission of highly efficient light sources | Light: Science & Applications (nature.com) (2013). Lozano G., Louwers D. J., Rodríguez Said R.K., Murai S., Jansen O.T.A., Verschuuren M. & Gómez Rivas J. Light: Science & Applications. Vol. 2, page 66

• Accuracy of wafer level alignment with substrate conformal imprint lithography | Journal of Vacuum Science & Technology B | AIP Publishing (2013). Fader R., Rommel M., Bauer A., Rumler M., Frey L.; Verschuuren M., Van de Laar R., Ji R., Schömbs U. Vol.31, Issue 6.

• Al2O3/TiO2 nano-pattern antireflection coating with ultralow surface recombination | Applied Physics Letters | AIP Publishing (2013). Spinelli P., Macco B., Verschuuren M., Kessels W.M.M  Polman A. Vol. 102, Issue 23

• Broadband omnidirectional antireflection coating based on subwavelength surface Mie resonators | Nature Communications (2012). Spinelli P., Verschuuren M. & Polman A. Nature Communications, Vol.3,  692

• Improved performance of polarization-stable VCSELs by monolithic sub-wavelength gratings produced by soft nano-imprint lithography – IOPscience (2011). M A Verschuuren M., Gerlach P., van Sprang H.A. and Polman A.  Nanotechnology, Vol. 22, Number 50

• Light trapping in ultrathin plasmonic solar cells (optica.org) (2010). Ferry V. E., Verschuuren M., Li H.b.T., Verhagen E., Walters R.J., Schropp R.E.I., Awater H.A., Poman A. Optics Express Vol. 18, Issue S2, pp. A237-A245

• Verschuuren – Substrate Conformal Imprint Lithography for Nanophotonics (erbium.nl). Verschuuren M. (2010)

• Enhanced coupling of plasmons in hole arrays with periodic dielectric antennas (optica.org) (2008). D. Stolwijk, E. F.C. Driessen, M. A. Verschuuren, G. W. ’t Hooft, M. P. van Exter, and M. J.A. de Dood. Optics Letters Vol. 33, Issue 4, pp. 363-365

• 3D Photonic Structures by Sol-Gel Imprint Lithography | SpringerLink (2007). Verschuuren  M. & Van Sprang, H. MRS Online Proceedings Library, 1002, 305